Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4193 |
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| Institution: | Nanyang Technological University |