Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD

In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.

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Bibliographic Details
Main Author:	Cui, Jie.
Other Authors:	Rusli
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
Online Access:	http://hdl.handle.net/10356/4193
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-4193
record_format	dspace
spelling	sg-ntu-dr.10356-41932023-07-04T15:01:48Z Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD Cui, Jie. Rusli School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films. Master of Engineering 2008-09-17T09:46:28Z 2008-09-17T09:46:28Z 2001 2001 Thesis http://hdl.handle.net/10356/4193 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Cui, Jie. Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
description	In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.
author2	Rusli
author_facet	Rusli Cui, Jie.
format	Theses and Dissertations
author	Cui, Jie.
author_sort	Cui, Jie.
title	Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
title_short	Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
title_full	Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
title_fullStr	Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
title_full_unstemmed	Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
title_sort	characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ecr-cvd
publishDate	2008
url	http://hdl.handle.net/10356/4193
_version_	1772829009512497152

Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD

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