Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP

Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP

In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.

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書目詳細資料
主要作者:	Leong, Daniel Woon Loong.
其他作者:	Ang, Ricky Lay Kee
格式:	Theses and Dissertations
出版:	2008
主題:	DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
在線閱讀:	http://hdl.handle.net/10356/4597
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	Nanyang Technological University

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