Processing and characterization of low-k materials for ULSI application

• 主要作者: Widodo, Johnny.
• 其他作者: Mhaisalkar, Subodh Gautam
• 格式: Theses and Dissertations
• 出版: 2008
• 主題: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
• 在線閱讀: http://hdl.handle.net/10356/5060
• 機構: Nanyang Technological University

In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied.