Synthesis and characterization of metal silicides nanostructures

Synthesis and characterization of metal silicides nanostructures

Metal silicides have been used extensively in microelectronics devices, such as contacts and local interconnects. With increasing research and development of a bottomup fabrication approach for semiconducting and metallic nanostructures, metal silicides nanostructures can continue to play an importa...

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Bibliographic Details
Main Author: Li, Shaozhou.
Other Authors: School of Materials Science & Engineering
Format: Theses and Dissertations
Language:English
Published: 2013
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:http://hdl.handle.net/10356/51007
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Institution: Nanyang Technological University
Language: English
Description
Summary:Metal silicides have been used extensively in microelectronics devices, such as contacts and local interconnects. With increasing research and development of a bottomup fabrication approach for semiconducting and metallic nanostructures, metal silicides nanostructures can continue to play an important role in the next generation of nanoelectronics. In this research, the crystallography and growth mechanism of several transition metal-silicide nanostructures grown on silicon substrates were investigated with the assistance of focus-ion beam (FIB) microscopy and transmission electron microscopy (TEM) analysis.

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