Synthesis and characterization of metal silicides nanostructures

Metal silicides have been used extensively in microelectronics devices, such as contacts and local interconnects. With increasing research and development of a bottomup fabrication approach for semiconducting and metallic nanostructures, metal silicides nanostructures can continue to play an importa...

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Main Author: Li, Shaozhou.
Other Authors: School of Materials Science & Engineering
Format: Theses and Dissertations
Language:English
Published: 2013
Subjects:
Online Access:http://hdl.handle.net/10356/51007
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Institution: Nanyang Technological University
Language: English
id sg-ntu-dr.10356-51007
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spelling sg-ntu-dr.10356-510072023-03-04T16:34:28Z Synthesis and characterization of metal silicides nanostructures Li, Shaozhou. School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects Metal silicides have been used extensively in microelectronics devices, such as contacts and local interconnects. With increasing research and development of a bottomup fabrication approach for semiconducting and metallic nanostructures, metal silicides nanostructures can continue to play an important role in the next generation of nanoelectronics. In this research, the crystallography and growth mechanism of several transition metal-silicide nanostructures grown on silicon substrates were investigated with the assistance of focus-ion beam (FIB) microscopy and transmission electron microscopy (TEM) analysis. Doctor of Philosophy (MSE) 2013-01-02T08:35:07Z 2013-01-02T08:35:07Z 2011 2011 Thesis Li, S. (2011). Synthesis and characterization of metal silicides nanostructures. Doctoral thesis, Nanyang Technological University, Singapore. http://hdl.handle.net/10356/51007 en 147 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
spellingShingle DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Li, Shaozhou.
Synthesis and characterization of metal silicides nanostructures
description Metal silicides have been used extensively in microelectronics devices, such as contacts and local interconnects. With increasing research and development of a bottomup fabrication approach for semiconducting and metallic nanostructures, metal silicides nanostructures can continue to play an important role in the next generation of nanoelectronics. In this research, the crystallography and growth mechanism of several transition metal-silicide nanostructures grown on silicon substrates were investigated with the assistance of focus-ion beam (FIB) microscopy and transmission electron microscopy (TEM) analysis.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Li, Shaozhou.
format Theses and Dissertations
author Li, Shaozhou.
author_sort Li, Shaozhou.
title Synthesis and characterization of metal silicides nanostructures
title_short Synthesis and characterization of metal silicides nanostructures
title_full Synthesis and characterization of metal silicides nanostructures
title_fullStr Synthesis and characterization of metal silicides nanostructures
title_full_unstemmed Synthesis and characterization of metal silicides nanostructures
title_sort synthesis and characterization of metal silicides nanostructures
publishDate 2013
url http://hdl.handle.net/10356/51007
_version_ 1759854764002115584