Polishing and planarization of polymeric materials for MEMS applications

In this dissertation, the CMP process on polycarbonate and PMMA blanket substrates were investigated. Initially, four types of slurries were tested on these samples under the same CMP process condition. Slurry with the lowest surface roughness was then chosen and together with variation in process p...

Full description

Saved in:
Bibliographic Details
Main Author: Tan, Yew Heng.
Other Authors: Zhong, Zhaowei
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/6501
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University