Polishing and planarization of polymeric materials for MEMS applications

• Main Author: Tan, Yew Heng.
• Other Authors: Zhong, Zhaowei
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectromechanical systems
• Online Access: http://hdl.handle.net/10356/6501
• Institution: Nanyang Technological University

In this dissertation, the CMP process on polycarbonate and PMMA blanket substrates were investigated. Initially, four types of slurries were tested on these samples under the same CMP process condition. Slurry with the lowest surface roughness was then chosen and together with variation in process p...