A numerical analysis and experimental demonstration of a low degradation conductive bridge resistive memory device

This study investigates a low degradation metal-ion conductive bridge RAM (CBRAM) structure. The structure is based on placing a diffusion blocking layer (DBL) between the device's top electrode (TE) and the resistive switching layer (RSL), unlike conventional CBRAMs, where the TE serves as a s...

Full description

Saved in:
Bibliographic Details
Main Authors: Berco, Dan, Chand, Umesh, Fariborzi, Hossein
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2017
Subjects:
Online Access:https://hdl.handle.net/10356/86697
http://hdl.handle.net/10220/44188
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English

Similar Items