A numerical analysis and experimental demonstration of a low degradation conductive bridge resistive memory device
This study investigates a low degradation metal-ion conductive bridge RAM (CBRAM) structure. The structure is based on placing a diffusion blocking layer (DBL) between the device's top electrode (TE) and the resistive switching layer (RSL), unlike conventional CBRAMs, where the TE serves as a s...
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Main Authors: | Berco, Dan, Chand, Umesh, Fariborzi, Hossein |
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Other Authors: | School of Electrical and Electronic Engineering |
Format: | Article |
Language: | English |
Published: |
2017
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/86697 http://hdl.handle.net/10220/44188 |
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Institution: | Nanyang Technological University |
Language: | English |
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