Multiple-pulse laser thermal annealing for the formation of Co-silicided junction
Formation of Co-silicide contact layers on narrow silicon regions using multiple-pulse excimer laser annealing is demonstrated. Excellent performance of junction leakage behavior can be attained on narrow-wi...
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Main Authors: | , , , , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2012
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/95649 http://hdl.handle.net/10220/8339 |
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Institution: | Nanyang Technological University |
Language: | English |
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