Multiple-pulse laser thermal annealing for the formation of Co-silicided junction

Formation of Co-silicide contact layers on narrow silicon regions using multiple-pulse excimer laser annealing is demonstrated. Excellent performance of junction leakage behavior can be attained on narrow-wi...

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Bibliographic Details
Main Authors: Lee, Pooi See, Pey, Kin Leong, Chow, F. L., Tang, L. J., Tung, Chih Hang, Wang, X. C., Lim, G. C.
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/95649
http://hdl.handle.net/10220/8339
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Institution: Nanyang Technological University
Language: English

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