Multiple-pulse laser thermal annealing for the formation of Co-silicided junction
Formation of Co-silicide contact layers on narrow silicon regions using multiple-pulse excimer laser annealing is demonstrated. Excellent performance of junction leakage behavior can be attained on narrow-wi...
Saved in:
Main Authors: | , , , , , , |
---|---|
其他作者: | |
格式: | Article |
語言: | English |
出版: |
2012
|
主題: | |
在線閱讀: | https://hdl.handle.net/10356/95649 http://hdl.handle.net/10220/8339 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |
語言: | English |
成為第一個發表評論!