Elemental thin film depth profiles by ion beam analysis using simulated annealing - A new tool

Elemental thin film depth profiles by ion beam analysis using simulated annealing - A new tool

10.1088/0022-3727/36/7/201

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Bibliographic Details
Main Authors: Jeynes, C., Barradas, N.P., Marriott, P.K., Boudreault, G., Jenkin, M., Wendler, E., Webb, R.P.
Other Authors: STATISTICS & APPLIED PROBABILITY
Format: Review
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/105496
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/105496

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