Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits

International Journal of Nanoscience

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Bibliographic Details
Main Authors:	Yang, L.Y., Zhang, D.H., Li, C.Y., Liu, R., Wee, A.T.S., Foo, P.D.
Other Authors:	INSTITUTE OF ENGINEERING SCIENCE
Format:	Article
Published:	2014
Subjects:	Ta(N) barrier Thermal stability Ultra low k
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113074
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-113074
record_format	dspace
spelling	sg-nus-scholar.10635-1130742015-01-06T21:56:26Z Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits Yang, L.Y. Zhang, D.H. Li, C.Y. Liu, R. Wee, A.T.S. Foo, P.D. INSTITUTE OF ENGINEERING SCIENCE PHYSICS Ta(N) barrier Thermal stability Ultra low k International Journal of Nanoscience 3 4-5 471-479 2014-11-28T09:11:41Z 2014-11-28T09:11:41Z 2004-08 Article Yang, L.Y.,Zhang, D.H.,Li, C.Y.,Liu, R.,Wee, A.T.S.,Foo, P.D. (2004-08). Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits. International Journal of Nanoscience 3 (4-5) : 471-479. ScholarBank@NUS Repository. 0219581X http://scholarbank.nus.edu.sg/handle/10635/113074 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Ta(N) barrier Thermal stability Ultra low k
spellingShingle	Ta(N) barrier Thermal stability Ultra low k Yang, L.Y. Zhang, D.H. Li, C.Y. Liu, R. Wee, A.T.S. Foo, P.D. Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits
description	International Journal of Nanoscience
author2	INSTITUTE OF ENGINEERING SCIENCE
author_facet	INSTITUTE OF ENGINEERING SCIENCE Yang, L.Y. Zhang, D.H. Li, C.Y. Liu, R. Wee, A.T.S. Foo, P.D.
format	Article
author	Yang, L.Y. Zhang, D.H. Li, C.Y. Liu, R. Wee, A.T.S. Foo, P.D.
author_sort	Yang, L.Y.
title	Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits
title_short	Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits
title_full	Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits
title_fullStr	Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits
title_full_unstemmed	Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits
title_sort	comparative study of ta and tan(n) in the barrier/ultra low k structures for deep submicron integrated circuits
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/113074
_version_	1681094598684835840

Comparative study of Ta and TaN(N) in the barrier/ultra low k structures for deep submicron integrated circuits

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