X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy

X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy

10.1016/j.physleta.2014.12.007

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Bibliographic Details
Main Authors: Kalaiselvi, Shenbaga M. P., Tan, Augustine Tuck Lee, Talebitaher, Alireza R., Lee, Paul, Heussler, Sascha Pierre, Breese, Mark Brian H., Rawat, Rajdeepsingh
Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
Format: Article
Published: Elsevier 2016
Online Access:http://scholarbank.nus.edu.sg/handle/10635/123571
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/123571

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