X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy

X-ray lithography of SU8 photoresist using fast miniature plasma focus device and its characterization using FTIR spectroscopy

10.1016/j.physleta.2014.12.007

Saved in:
Bibliographic Details
Main Authors: Kalaiselvi, Shenbaga M. P., Tan, Augustine Tuck Lee, Talebitaher, Alireza R., Lee, Paul, Heussler, Sascha Pierre, Breese, Mark Brian H., Rawat, Rajdeepsingh
Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
Format: Article
Published: Elsevier 2016
Online Access:http://scholarbank.nus.edu.sg/handle/10635/123571
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items

Similar Items