Surface passivation investigation on ultra-thin atomic layer deposited aluminum oxide layers for their potential application to form tunnel layer passivated contacts

10.7567/JJAP.56.08MB14

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Bibliographic Details
Main Authors: Xin, Zheng, Ling, Zhi Peng, Nandakumar, Naomi, Kaur, Gurleen, Ke, Cangming, Liao, Baochen, Aberle, Armin G, Stangl, Rolf
Other Authors: DEPT OF ELECTRICAL & COMPUTER ENGG
Format: Article
Language:English
Published: IOP PUBLISHING LTD 2019
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/155043
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Institution: National University of Singapore
Language: English

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