Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology

Ph.D

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Bibliographic Details
Main Author:	LI RUI
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	MOSFET; metal germanide; Schottky source/drain; high-k dielectrics; germanium; laser annealing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15886
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-15886
record_format	dspace
spelling	sg-nus-scholar.10635-158862015-01-17T13:56:09Z Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology LI RUI ELECTRICAL & COMPUTER ENGINEERING LEE SUNGJOO MOSFET; metal germanide; Schottky source/drain; high-k dielectrics; germanium; laser annealing Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:58:31Z 2010-04-08T10:58:31Z 2009-04-29 Thesis LI RUI (2009-04-29). Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15886 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	MOSFET; metal germanide; Schottky source/drain; high-k dielectrics; germanium; laser annealing
spellingShingle	MOSFET; metal germanide; Schottky source/drain; high-k dielectrics; germanium; laser annealing LI RUI Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING LI RUI
format	Theses and Dissertations
author	LI RUI
author_sort	LI RUI
title	Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
title_short	Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
title_full	Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
title_fullStr	Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
title_full_unstemmed	Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
title_sort	schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/15886
_version_	1681079270082871296

Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology

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