Schottky source/drain transistor integrated with high-k and metal gate for sub-tenth nm technology

Ph.D

Saved in:
Bibliographic Details
Main Author: LI RUI
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15886
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Language: English

Similar Items