Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology
Master's
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2010
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sg-nus-scholar.10635-165712024-10-26T02:12:57Z Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology LIN JIANQIANG ELECTRICAL & COMPUTER ENGINEERING LEE SUNGJOO MOSFET, InGaAs, high mobility, passivation, Self-alignment Master's MASTER OF ENGINEERING 2010-04-08T11:06:38Z 2010-04-08T11:06:38Z 2009-08-20 Thesis LIN JIANQIANG (2009-08-20). Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/16571 NOT_IN_WOS en |
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Singapore Singapore |
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ScholarBank@NUS |
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MOSFET, InGaAs, high mobility, passivation, Self-alignment |
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MOSFET, InGaAs, high mobility, passivation, Self-alignment LIN JIANQIANG Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology |
description |
Master's |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING LIN JIANQIANG |
format |
Theses and Dissertations |
author |
LIN JIANQIANG |
author_sort |
LIN JIANQIANG |
title |
Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology |
title_short |
Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology |
title_full |
Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology |
title_fullStr |
Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology |
title_full_unstemmed |
Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology |
title_sort |
novel iii-v mosfet integrated with high-k dielectric and metal gate for future cmos technology |
publishDate |
2010 |
url |
https://scholarbank.nus.edu.sg/handle/10635/16571 |
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1821188710607093760 |