Novel III-V mosfet integrated with high-k dielectric and metal gate for future CMOS technology

Master's

Saved in:
Bibliographic Details
Main Author: LIN JIANQIANG
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/16571
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Language: English
Be the first to leave a comment!
You must be logged in first