Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure

Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure

10.1038/s41598-017-01449-1

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Bibliographic Details
Main Authors: Wang, W, Lei, D, Dong, Y, Gong, X, Tok, E.S, Yeo, Y.-C
Other Authors: DEPT OF ELECTRICAL & COMPUTER ENGG
Format: Article
Published: 2020
Online Access:https://scholarbank.nus.edu.sg/handle/10635/178324
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Institution: National University of Singapore

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https://scholarbank.nus.edu.sg/handle/10635/178324

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