Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure
10.1038/s41598-017-01449-1
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Main Authors: | , , , , , |
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Other Authors: | |
Format: | Article |
Published: |
2020
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Online Access: | https://scholarbank.nus.edu.sg/handle/10635/178324 |
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Institution: | National University of Singapore |