Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure
10.1038/s41598-017-01449-1
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sg-nus-scholar.10635-1783242023-09-06T08:52:28Z Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure Wang, W Lei, D Dong, Y Gong, X Tok, E.S Yeo, Y.-C DEPT OF ELECTRICAL & COMPUTER ENGG DEPT OF PHYSICS 10.1038/s41598-017-01449-1 Scientific Reports 7 1 1835 2020-10-20T09:13:25Z 2020-10-20T09:13:25Z 2017 Article Wang, W, Lei, D, Dong, Y, Gong, X, Tok, E.S, Yeo, Y.-C (2017). Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure. Scientific Reports 7 (1) : 1835. ScholarBank@NUS Repository. https://doi.org/10.1038/s41598-017-01449-1 20452322 https://scholarbank.nus.edu.sg/handle/10635/178324 Attribution 4.0 International http://creativecommons.org/licenses/by/4.0/ Unpaywall 20201031 |
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10.1038/s41598-017-01449-1 |
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DEPT OF ELECTRICAL & COMPUTER ENGG |
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DEPT OF ELECTRICAL & COMPUTER ENGG Wang, W Lei, D Dong, Y Gong, X Tok, E.S Yeo, Y.-C |
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Wang, W Lei, D Dong, Y Gong, X Tok, E.S Yeo, Y.-C |
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Wang, W Lei, D Dong, Y Gong, X Tok, E.S Yeo, Y.-C Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure |
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Wang, W |
title |
Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure |
title_short |
Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure |
title_full |
Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure |
title_fullStr |
Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure |
title_full_unstemmed |
Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure |
title_sort |
digital etch technique for forming ultra-scaled germanium-tin (ge 1-x sn x) fin structure |
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2020 |
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https://scholarbank.nus.edu.sg/handle/10635/178324 |
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