Digital etch technique for forming ultra-scaled germanium-tin (Ge 1-x Sn x) fin structure
10.1038/s41598-017-01449-1
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| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
2020
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| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/178324 |
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| Institution: | National University of Singapore |