Process flow for a performance enhanced MOSFET with self-aligned, recessed channel

• Main Authors: SNEELAL, SNEEDHARAN PILLAI, POH, FRANCIS YOUG WEE, LEE, JAMES YONG MENG, SEE, ALEX, LAU, C. K., SAMUDRA, GANESH SHANKAR
• Other Authors: PHYSICS
• Format: Patent
• Published: 2012
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/32609
• Institution: National University of Singapore

US6391720