Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements
10.1109/LED.2003.817390
Saved in:
| Main Authors: | , , , , , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
2014
|
| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/50983 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-50983 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-509832023-10-27T07:18:46Z Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements Chim, W.K. Wong, K.M. Yeow, Y.T. Hong, Y.D. Lei, Y. Teo, L.W. Choi, W.K. ELECTRICAL & COMPUTER ENGINEERING SINGAPORE-MIT ALLIANCE Interface trap Oxide quality Scanning capacitance microscopy (SCM) Semiconductor dopant extraction 10.1109/LED.2003.817390 IEEE Electron Device Letters 24 10 667-670 EDLED 2014-04-24T07:23:07Z 2014-04-24T07:23:07Z 2003-10 Article Chim, W.K., Wong, K.M., Yeow, Y.T., Hong, Y.D., Lei, Y., Teo, L.W., Choi, W.K. (2003-10). Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements. IEEE Electron Device Letters 24 (10) : 667-670. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2003.817390 07413106 http://scholarbank.nus.edu.sg/handle/10635/50983 000185567900019 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
Interface trap Oxide quality Scanning capacitance microscopy (SCM) Semiconductor dopant extraction |
| spellingShingle |
Interface trap Oxide quality Scanning capacitance microscopy (SCM) Semiconductor dopant extraction Chim, W.K. Wong, K.M. Yeow, Y.T. Hong, Y.D. Lei, Y. Teo, L.W. Choi, W.K. Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements |
| description |
10.1109/LED.2003.817390 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Chim, W.K. Wong, K.M. Yeow, Y.T. Hong, Y.D. Lei, Y. Teo, L.W. Choi, W.K. |
| format |
Article |
| author |
Chim, W.K. Wong, K.M. Yeow, Y.T. Hong, Y.D. Lei, Y. Teo, L.W. Choi, W.K. |
| author_sort |
Chim, W.K. |
| title |
Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements |
| title_short |
Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements |
| title_full |
Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements |
| title_fullStr |
Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements |
| title_full_unstemmed |
Monitoring Oxide Quality Using the Spread of the dC/dV Peak in Scanning Capacitance Microscopy Measurements |
| title_sort |
monitoring oxide quality using the spread of the dc/dv peak in scanning capacitance microscopy measurements |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/50983 |
| _version_ |
1781411642369638400 |