Comparative study of radiation- and stress-induced leakage currents in thin gate oxides

Comparative study of radiation- and stress-induced leakage currents in thin gate oxides

10.1088/0268-1242/15/10/305

Saved in:
Bibliographic Details
Main Authors: Ang, C.H., Ling, C.H., Cheng, Z.Y., Kim, S.J., Cho, B.J.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/61949
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1088/0268-1242/15/10/305

Similar Items