Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation

10.1016/S0038-1101(00)00037-X

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Main Authors: Cho, B.J., Kim, S.J., Ling, C.H., Joo, M.-S., Yeo, I.-S.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/61950
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-619502023-10-29T22:06:46Z Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation Cho, B.J. Kim, S.J. Ling, C.H. Joo, M.-S. Yeo, I.-S. ELECTRICAL ENGINEERING 10.1016/S0038-1101(00)00037-X Solid-State Electronics 44 7 1289-1292 SSELA 2014-06-17T06:45:47Z 2014-06-17T06:45:47Z 2000-07-01 Article Cho, B.J., Kim, S.J., Ling, C.H., Joo, M.-S., Yeo, I.-S. (2000-07-01). Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation. Solid-State Electronics 44 (7) : 1289-1292. ScholarBank@NUS Repository. https://doi.org/10.1016/S0038-1101(00)00037-X 00381101 http://scholarbank.nus.edu.sg/handle/10635/61950 000087297100026 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1016/S0038-1101(00)00037-X
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Cho, B.J.
Kim, S.J.
Ling, C.H.
Joo, M.-S.
Yeo, I.-S.
format Article
author Cho, B.J.
Kim, S.J.
Ling, C.H.
Joo, M.-S.
Yeo, I.-S.
spellingShingle Cho, B.J.
Kim, S.J.
Ling, C.H.
Joo, M.-S.
Yeo, I.-S.
Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
author_sort Cho, B.J.
title Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
title_short Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
title_full Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
title_fullStr Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
title_full_unstemmed Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation
title_sort comparison between leakage currents in thin gate oxides subjected to x-ray radiation and electrical stress degradation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/61950
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