Effects of tungsten silicidation on Fowler-Nordheim tunnelling current and charge trapping in polysilicon-oxide-silicon capacitors

Effects of tungsten silicidation on Fowler-Nordheim tunnelling current and charge trapping in polysilicon-oxide-silicon capacitors

Electronics Letters

Saved in:
Bibliographic Details
Main Authors: Ling, C.H., Ooi, J.A., Ang, D.S.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
MOS capacitors
Tunnelling
Online Access:http://scholarbank.nus.edu.sg/handle/10635/62103
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:Electronics Letters

Similar Items