Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
10.1149/1.2806801
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sg-nus-scholar.10635-647692023-10-26T20:42:42Z Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Chan, L. Ramam, A. Srinivasan, M.P. PHYSICS CHEMICAL & BIOMOLECULAR ENGINEERING 10.1149/1.2806801 Journal of the Electrochemical Society 155 2 H69-H75 JESOA 2014-06-17T07:51:06Z 2014-06-17T07:51:06Z 2008 Article Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P. (2008). Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing. Journal of the Electrochemical Society 155 (2) : H69-H75. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2806801 00134651 http://scholarbank.nus.edu.sg/handle/10635/64769 000251906800059 Scopus |
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PHYSICS Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Chan, L. Ramam, A. Srinivasan, M.P. |
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Article |
author |
Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Chan, L. Ramam, A. Srinivasan, M.P. |
spellingShingle |
Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Chan, L. Ramam, A. Srinivasan, M.P. Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing |
author_sort |
Yeong, S.H. |
title |
Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing |
title_short |
Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing |
title_full |
Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing |
title_fullStr |
Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing |
title_full_unstemmed |
Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing |
title_sort |
understanding of carbon/fluorine co-implant effect on boron-doped junction formed during soak annealing |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/64769 |
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1781782488805277696 |