Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing

10.1149/1.2806801

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Main Authors: Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/64769
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-647692023-10-26T20:42:42Z Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing Yeong, S.H. Colombeau, B. Mok, K.R.C. Benistant, F. Liu, C.J. Wee, A.T.S. Chan, L. Ramam, A. Srinivasan, M.P. PHYSICS CHEMICAL & BIOMOLECULAR ENGINEERING 10.1149/1.2806801 Journal of the Electrochemical Society 155 2 H69-H75 JESOA 2014-06-17T07:51:06Z 2014-06-17T07:51:06Z 2008 Article Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P. (2008). Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing. Journal of the Electrochemical Society 155 (2) : H69-H75. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2806801 00134651 http://scholarbank.nus.edu.sg/handle/10635/64769 000251906800059 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/1.2806801
author2 PHYSICS
author_facet PHYSICS
Yeong, S.H.
Colombeau, B.
Mok, K.R.C.
Benistant, F.
Liu, C.J.
Wee, A.T.S.
Chan, L.
Ramam, A.
Srinivasan, M.P.
format Article
author Yeong, S.H.
Colombeau, B.
Mok, K.R.C.
Benistant, F.
Liu, C.J.
Wee, A.T.S.
Chan, L.
Ramam, A.
Srinivasan, M.P.
spellingShingle Yeong, S.H.
Colombeau, B.
Mok, K.R.C.
Benistant, F.
Liu, C.J.
Wee, A.T.S.
Chan, L.
Ramam, A.
Srinivasan, M.P.
Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
author_sort Yeong, S.H.
title Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
title_short Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
title_full Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
title_fullStr Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
title_full_unstemmed Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
title_sort understanding of carbon/fluorine co-implant effect on boron-doped junction formed during soak annealing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/64769
_version_ 1781782488805277696