Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing

• Main Authors: Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P.
• 其他作者: PHYSICS
• 格式: Article
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/64769
• 機構: National University of Singapore

10.1149/1.2806801