Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing
10.1149/1.2806801
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Main Authors: | Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/64769 |
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Institution: | National University of Singapore |
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