Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing

Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing

10.1149/1.2806801

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書目詳細資料
Main Authors:	Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P.
其他作者:	PHYSICS
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/64769
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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