Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs
10.1088/0268-1242/17/6/101
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2014
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sg-nus-scholar.10635-679662023-10-26T21:39:28Z Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs Lek, C.M. Cho, B.J. Ang, C.H. Tan, S.S. Loh, W.Y. Zhen, J.Z. Lap, C. ELECTRICAL & COMPUTER ENGINEERING 10.1088/0268-1242/17/6/101 Semiconductor Science and Technology 17 6 L25-L28 SSTEE 2014-06-18T05:33:01Z 2014-06-18T05:33:01Z 2002-06 Others Lek, C.M., Cho, B.J., Ang, C.H., Tan, S.S., Loh, W.Y., Zhen, J.Z., Lap, C. (2002-06). Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs. Semiconductor Science and Technology 17 (6) : L25-L28. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/17/6/101 02681242 http://scholarbank.nus.edu.sg/handle/10635/67966 000176642800001 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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10.1088/0268-1242/17/6/101 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Lek, C.M. Cho, B.J. Ang, C.H. Tan, S.S. Loh, W.Y. Zhen, J.Z. Lap, C. |
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Others |
| author |
Lek, C.M. Cho, B.J. Ang, C.H. Tan, S.S. Loh, W.Y. Zhen, J.Z. Lap, C. |
| spellingShingle |
Lek, C.M. Cho, B.J. Ang, C.H. Tan, S.S. Loh, W.Y. Zhen, J.Z. Lap, C. Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs |
| author_sort |
Lek, C.M. |
| title |
Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs |
| title_short |
Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs |
| title_full |
Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs |
| title_fullStr |
Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs |
| title_full_unstemmed |
Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs |
| title_sort |
impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel mosfets |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/67966 |
| _version_ |
1781782952291598336 |