Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs

• Main Authors: Lek, C.M., Cho, B.J., Ang, C.H., Tan, S.S., Loh, W.Y., Zhen, J.Z., Lap, C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Others
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/67966
• Institution: National University of Singapore

10.1088/0268-1242/17/6/101