Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack
10.1149/1.3203977
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2014
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sg-nus-scholar.10635-700072023-10-26T07:57:36Z Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack Ya Lim, P.S. Chi, D.Z. Lo, G.Q. Yeo, Y.C. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.3203977 ECS Transactions 25 7 405-410 2014-06-19T03:07:08Z 2014-06-19T03:07:08Z 2009 Conference Paper Ya Lim, P.S., Chi, D.Z., Lo, G.Q., Yeo, Y.C. (2009). Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack. ECS Transactions 25 (7) : 405-410. ScholarBank@NUS Repository. https://doi.org/10.1149/1.3203977 9781566777445 19385862 http://scholarbank.nus.edu.sg/handle/10635/70007 000338102400038 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Ya Lim, P.S. Chi, D.Z. Lo, G.Q. Yeo, Y.C. |
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Conference or Workshop Item |
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Ya Lim, P.S. Chi, D.Z. Lo, G.Q. Yeo, Y.C. |
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Ya Lim, P.S. Chi, D.Z. Lo, G.Q. Yeo, Y.C. Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack |
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Ya Lim, P.S. |
title |
Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack |
title_short |
Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack |
title_full |
Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack |
title_fullStr |
Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack |
title_full_unstemmed |
Dopant Segregated Schottky (DSS) Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack |
title_sort |
dopant segregated schottky (dss) source/drain for germanium p-mosfets with metal gate/high-k dielectric stack |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/70007 |
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