Process method to suppress the effect of phase errors in alternating phase shift masks
10.1116/1.1885012
Saved in:
Main Authors: | Singh, N., Roy, M.M., Mehta, S.S., Adeyeye, A.O. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/71511 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Swing effects in alternating phase shift mask lithography: Implications of low σ illumination
by: Singh, N., et al.
Published: (2014) -
A new approach for eliminating unwanted patterns in attenuated phase shift masks
by: Mukherjee-Roy, M., et al.
Published: (2014) -
Impact of transmission error for attenuated phase shift mask for 0.10 um Technology
by: Tan, S.K., et al.
Published: (2014) -
Edge effects characterization of phase shift mask
by: Chua, G.S., et al.
Published: (2014) -
Suppressing motion-induced phase error by using equal-step phase-shifting algorithms in fringe projection profilometry
by: Wu, Gaoxu, et al.
Published: (2022)