Study of process dependent reliability in SiOC dielectric interconnects and film

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Bibliographic Details
Main Authors: Mok, T.S., Yoo, W.J., Krishnamoorthy, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71884
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-718842024-11-12T22:38:20Z Study of process dependent reliability in SiOC dielectric interconnects and film Mok, T.S. Yoo, W.J. Krishnamoorthy, A. ELECTRICAL & COMPUTER ENGINEERING Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 181-184 2014-06-19T03:28:56Z 2014-06-19T03:28:56Z 2004 Conference Paper Mok, T.S.,Yoo, W.J.,Krishnamoorthy, A. (2004). Study of process dependent reliability in SiOC dielectric interconnects and film. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 181-184. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/71884 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Mok, T.S.
Yoo, W.J.
Krishnamoorthy, A.
format Conference or Workshop Item
author Mok, T.S.
Yoo, W.J.
Krishnamoorthy, A.
spellingShingle Mok, T.S.
Yoo, W.J.
Krishnamoorthy, A.
Study of process dependent reliability in SiOC dielectric interconnects and film
author_sort Mok, T.S.
title Study of process dependent reliability in SiOC dielectric interconnects and film
title_short Study of process dependent reliability in SiOC dielectric interconnects and film
title_full Study of process dependent reliability in SiOC dielectric interconnects and film
title_fullStr Study of process dependent reliability in SiOC dielectric interconnects and film
title_full_unstemmed Study of process dependent reliability in SiOC dielectric interconnects and film
title_sort study of process dependent reliability in sioc dielectric interconnects and film
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/71884
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