Study of process dependent reliability in SiOC dielectric interconnects and film

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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書目詳細資料
Main Authors: Mok, T.S., Yoo, W.J., Krishnamoorthy, A.
其他作者: ELECTRICAL & COMPUTER ENGINEERING
格式: Conference or Workshop Item
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/71884
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機構: National University of Singapore