Evaluation of the strain state in SiGe/Si heterostructures by high resolution X-ray diffraction and convergent beam electron diffraction

• المؤلفون الرئيسيون: Toh, S.L., Li, K., Ang, C.H., Rao, R., Er, E., Loh, K.P., Boothroyd, C.B., Chan, L.
• مؤلفون آخرون: CHEMISTRY
• التنسيق: Conference or Workshop Item
• منشور في: 2014
• الوصول للمادة أونلاين: http://scholarbank.nus.edu.sg/handle/10635/77440
• المؤسسة: National University of Singapore

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA