Evaluation of the strain state in SiGe/Si heterostructures by high resolution X-ray diffraction and convergent beam electron diffraction

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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書目詳細資料
Main Authors: Toh, S.L., Li, K., Ang, C.H., Rao, R., Er, E., Loh, K.P., Boothroyd, C.B., Chan, L.
其他作者: CHEMISTRY
格式: Conference or Workshop Item
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/77440
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機構: National University of Singapore
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總結:Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA