Radiation and electrical stress-induced hole trap-assisted tunneling currents in ultrathin gate oxides

Radiation and electrical stress-induced hole trap-assisted tunneling currents in ultrathin gate oxides

10.1016/S0038-1101(00)00156-8

Saved in:
Bibliographic Details
Main Authors: Ang, C.-H., Ling, C.-H., Cho, B.-J., Kim, S.-J., Cheng, Z.-Y.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81038
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1016/S0038-1101(00)00156-8

Similar Items