Radiation and electrical stress-induced hole trap-assisted tunneling currents in ultrathin gate oxides

• Main Authors: Ang, C.-H., Ling, C.-H., Cho, B.-J., Kim, S.-J., Cheng, Z.-Y.
• Other Authors: ELECTRICAL ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/81038
• Institution: National University of Singapore

10.1016/S0038-1101(00)00156-8