Thermal studies on stress-induced void-like defects in epitaxial-CoSi 2 formation

• Main Authors: Ho, C.S., Pey, K.L., Tung, C.H., Tee, K.C., Prasad, K., Saigal, D., Tan, J.J.L., Wong, H., Lee, K.H., Osipowicz, T., Chua, S.J., Karunasiri, R.P.G.
• 其他作者: ELECTRICAL ENGINEERING
• 格式: Article
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/81281
• 機構: National University of Singapore

Materials Research Society Symposium - Proceedings