A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors:	Lau, W.S., Khaw, K.K., Qian, P.W., Sandler, N.P., Chu, P.K.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Review
Published:	2014
Subjects:	Chemical vapor deposition (CVD) Defect states Leakage current Nitrous oxide (N2O) Oxygen Rapid thermal annealing (RTA) Tantalum pentoxide (Ta2O5) Thermally stimulated currrent (TSC) Traps
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81813
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81813
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spelling	sg-nus-scholar.10635-818132015-01-06T22:27:18Z A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy Lau, W.S. Khaw, K.K. Qian, P.W. Sandler, N.P. Chu, P.K. ELECTRICAL ENGINEERING Chemical vapor deposition (CVD) Defect states Leakage current Nitrous oxide (N2O) Oxygen Rapid thermal annealing (RTA) Tantalum pentoxide (Ta2O5) Thermally stimulated currrent (TSC) Traps Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 35 5 SUPPL. A 2599-2604 JAPND 2014-10-07T03:12:18Z 2014-10-07T03:12:18Z 1996-05 Review Lau, W.S.,Khaw, K.K.,Qian, P.W.,Sandler, N.P.,Chu, P.K. (1996-05). A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 35 (5 SUPPL. A) : 2599-2604. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/81813 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Chemical vapor deposition (CVD) Defect states Leakage current Nitrous oxide (N2O) Oxygen Rapid thermal annealing (RTA) Tantalum pentoxide (Ta2O5) Thermally stimulated currrent (TSC) Traps
spellingShingle	Chemical vapor deposition (CVD) Defect states Leakage current Nitrous oxide (N2O) Oxygen Rapid thermal annealing (RTA) Tantalum pentoxide (Ta2O5) Thermally stimulated currrent (TSC) Traps Lau, W.S. Khaw, K.K. Qian, P.W. Sandler, N.P. Chu, P.K. A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
description	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Lau, W.S. Khaw, K.K. Qian, P.W. Sandler, N.P. Chu, P.K.
format	Review
author	Lau, W.S. Khaw, K.K. Qian, P.W. Sandler, N.P. Chu, P.K.
author_sort	Lau, W.S.
title	A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
title_short	A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
title_full	A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
title_fullStr	A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
title_full_unstemmed	A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
title_sort	comparison of defect states in tantalum pentoxide (ta2o5) films after rapid thermal annealing in o2 or n2o by zero-bias thermally stimulated current spectroscopy
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81813
_version_	1681089139434323968

A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy

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