A comparison of defect states in tantalum pentoxide (Ta2O5) films after rapid thermal annealing in O2 or N2O by zero-bias thermally stimulated current spectroscopy
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
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Main Authors: | Lau, W.S., Khaw, K.K., Qian, P.W., Sandler, N.P., Chu, P.K. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Review |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81813 |
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Institution: | National University of Singapore |
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