Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs

10.1063/1.2840132

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Bibliographic Details
Main Authors:	Dalapati, G.K., Sridhara, A., Wong, A.S.W., Chia, C.K., Lee, S.J., Chi, D.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82046
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Institution:	National University of Singapore

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Summary:	10.1063/1.2840132

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