Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs

10.1063/1.2840132

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Bibliographic Details
Main Authors:	Dalapati, G.K., Sridhara, A., Wong, A.S.W., Chia, C.K., Lee, S.J., Chi, D.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82046
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82046
record_format	dspace
spelling	sg-nus-scholar.10635-820462023-10-26T09:02:21Z Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs Dalapati, G.K. Sridhara, A. Wong, A.S.W. Chia, C.K. Lee, S.J. Chi, D. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2840132 Journal of Applied Physics 103 3 - JAPIA 2014-10-07T04:24:45Z 2014-10-07T04:24:45Z 2008 Article Dalapati, G.K., Sridhara, A., Wong, A.S.W., Chia, C.K., Lee, S.J., Chi, D. (2008). Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs. Journal of Applied Physics 103 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2840132 00218979 http://scholarbank.nus.edu.sg/handle/10635/82046 000253238100084 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2840132
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Dalapati, G.K. Sridhara, A. Wong, A.S.W. Chia, C.K. Lee, S.J. Chi, D.
format	Article
author	Dalapati, G.K. Sridhara, A. Wong, A.S.W. Chia, C.K. Lee, S.J. Chi, D.
spellingShingle	Dalapati, G.K. Sridhara, A. Wong, A.S.W. Chia, C.K. Lee, S.J. Chi, D. Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs
author_sort	Dalapati, G.K.
title	Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs
title_short	Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs
title_full	Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs
title_fullStr	Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs
title_full_unstemmed	Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs
title_sort	characterization of sputtered tio2 gate dielectric on aluminum oxynitride passivated p-gaas
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82046
_version_	1781784048645963776

Characterization of sputtered TiO2 gate dielectric on aluminum oxynitride passivated p-GaAs

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