Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates

Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates

10.1109/TED.2008.927391

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Bibliographic Details
Main Authors: Lim, A.E.-J., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Fully silicided (FUSI)
Interlayer
Metal gate
NiSi
Rare-Earth (RE)
Silicate
Work function engineering
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82788
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Institution: National University of Singapore
Description
Summary:10.1109/TED.2008.927391

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