Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates

10.1109/TED.2008.927391

Saved in:

Bibliographic Details
Main Authors:	Lim, A.E.-J., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Fully silicided (FUSI) Interlayer Metal gate NiSi Rare-Earth (RE) Silicate Work function engineering
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82788
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-82788
record_format	dspace
spelling	sg-nus-scholar.10635-827882023-10-27T08:58:21Z Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates Lim, A.E.-J. Lee, R.T.P. Samudra, G.S. Kwong, D.-L. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Fully silicided (FUSI) Interlayer Metal gate NiSi Rare-Earth (RE) Silicate Work function engineering 10.1109/TED.2008.927391 IEEE Transactions on Electron Devices 55 9 2370-2377 IETDA 2014-10-07T04:33:31Z 2014-10-07T04:33:31Z 2008 Article Lim, A.E.-J., Lee, R.T.P., Samudra, G.S., Kwong, D.-L., Yeo, Y.-C. (2008). Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates. IEEE Transactions on Electron Devices 55 (9) : 2370-2377. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2008.927391 00189383 http://scholarbank.nus.edu.sg/handle/10635/82788 000258914000011 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Fully silicided (FUSI) Interlayer Metal gate NiSi Rare-Earth (RE) Silicate Work function engineering
spellingShingle	Fully silicided (FUSI) Interlayer Metal gate NiSi Rare-Earth (RE) Silicate Work function engineering Lim, A.E.-J. Lee, R.T.P. Samudra, G.S. Kwong, D.-L. Yeo, Y.-C. Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates
description	10.1109/TED.2008.927391
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Lim, A.E.-J. Lee, R.T.P. Samudra, G.S. Kwong, D.-L. Yeo, Y.-C.
format	Article
author	Lim, A.E.-J. Lee, R.T.P. Samudra, G.S. Kwong, D.-L. Yeo, Y.-C.
author_sort	Lim, A.E.-J.
title	Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates
title_short	Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates
title_full	Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates
title_fullStr	Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates
title_full_unstemmed	Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates
title_sort	novel rare-earth dielectric interlayers for wide nmos work-function tunability in ni-fusi gates
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82788
_version_	1781784223331385344

Novel rare-earth dielectric interlayers for wide NMOS work-function tunability in Ni-FUSI gates

Similar Items